师资队伍

苏金宝

电话:010-67391641-888

E-mail:sujinbao@bjut.edu.cn

通讯地址:北京市朝阳区平乐园100号北京工业大学数理楼

研究兴趣

1金属氧化物薄膜晶体管(TFT

2垂直腔面发射激光器VCSEL及半导体光电子器件与集成

教育背景

北京交通大学 电子科学与技术   博士 

美国布朗大学 电子工程     联合培养博士

工作履历

北京工业大学信息学部教师

科研项目

主持2项校级科研项目,作为科研骨干参与2项国家自然科学基金面上项目、2项校级科研项目和1项美国国家科学基金会(NSF)项目。

期刊论文

1. J Su, H Yang, Y Ma, R Li, L Jia, D Liu, X Zhang, Annealing atmosphere-dependent electrical characteristics and bias stability of N-doped InZnSnO thin film transistors, Materials Science in Semiconductor Processing, 113C: 105040, 2020.

2. J Su, R Li, Y Ma, S Dai, Y Wang, H Yang, X Zhang, Annealing temperature effects on the structural and electrical properties of N-doped In-Zn-Sn-O thin film transistors, Journal of Alloys and Compounds, 801: 33-39, 2019.

3. J Su, Q Wang, Y Ma, R Li, S Dai, Y Wang, H Yang, X Zhang, Amorphous InZnO: Li/ZnSnO: Li dual-active-layer thin film transistors, Materials Research Bulletin, 111: 165-169, 2019.

4. J Su, Y Wang, Y Ma, Q Wang, L Tian, S Dai, R Li, X Zhang, Y Wang, Preparation and electrical characteristics of N-doped In-Zn-Sn-O thin film transistors by radio frequency magnetron sputtering, Journal of Alloys and Compounds, 750: 1003-1006, 2018.

5. J Su, Y Ma, H Yang, R Li, L Jia, D Liu, X Zhang, Electrical characteristics of Li and N co-doped amorphous InZnSnO thin film transistors, Journal of Vacuum Science & Technology A, 37, no. 6: 061511, 2019.

6. J Su, H Yang, W Yang, X Zhang, Electrical characteristics of tungsten doped InZnSnO thin film transistors by RF magnetron sputtering, Journal of Vacuum Science & Technology B, 40, no. 3: 032201, 2022.

7. H Yang, J Su, X Zhang, Semiconductor Science and Technology 36, no. 4: 045006, 2021.

8. L Jia, J Su, D Liu, H Yang, R Li, Y Ma, L Yi, X Zhang, Materials Science in Semiconductor Processing 106: 104762, 2020.

9. H Yang, J Su, R Li, L Jia, D Liu, Y Ma, X Zhang, Superlattices and Microstructures 141: 106489, 2020.

10. Y Wang, J Su, S Dai, R Li, Y Ma, Q Wang, L Tian, K Ning, X Zhang, Journal of Materials Science: Materials in Electronics. 2: 1496-1499, 2019.

11. W Yang, H Yang, J Su, X Zhang, Vacuum 205: 111419, 2022.

12. S Dai, T Wang, R Li, Q Wang, Y Ma, L Tian, J Su, Y Wang, X Zhang, Y Wang, Journal of Alloys and Compounds 745: 256-261, 2018.

荣誉和获奖

1博士研究生国家奖学金(教育部)

2.国家建设高水平大学公派研究生项目奖学金(国家留学基金委)